Effective CLEAN algorithms for performance-enhanced detection of binary coding radar signalsHAI DENG.IEEE transactions on signal processing. 2004, Vol 52, Num 1, pp 72-78, issn 1053-587X, 7 p.Article

Isotactic polymerization of tert-butyl acrylate with chiral zirconoceneHAI DENG; SOGA, K.Macromolecules. 1996, Vol 29, Num 5, pp 1847-1848, issn 0024-9297Article

Concurrent extraction of target range and doppler information by using orthogonal coding waveformsHAI DENG; HIMED, Braham; WICKS, Michael C et al.IEEE transactions on signal processing. 2007, Vol 55, Num 7, pp 3294-3301, issn 1053-587X, 8 p., 1Article

Polymerization of methyl methacrylate with achiral 4B group metallocene compoundsHAI DENG; SHIONO, T; SOGA, K et al.Macromolecular chemistry and physics (Print). 1995, Vol 196, Num 6, pp 1971-1980, issn 1022-1352Article

Synthesis of star-shaped poly(p-alkoxystyrenes) by living cationic polymerizationHAI DENG; KANAOKA, S; SAWAMOTO, M et al.Macromolecules. 1996, Vol 29, Num 5, pp 1772-1777, issn 0024-9297Article

Stereospecific polymerization of methyl methacrylate initiated by dimethylzirconocene/B(C₆F₅)₃ (or Ph₃CB(C₆F₅)₄)/Zn(C₂H₅)₂SOGA, K; HAI DENG; YANO, T et al.Macromolecules. 1994, Vol 27, Num 26, pp 7938-7940, issn 0024-9297Article

A model for distribution of oxygen in multicrystalline silicon ingot grown by directional solidificationZHENQIANG XI; JUN TANG; HAI DENG et al.Solar energy materials and solar cells. 2007, Vol 91, Num 18, pp 1688-1691, issn 0927-0248, 4 p.Article

Polymerization of methyl methacrylate using organocalcium compoundsYUFANG LI; HAI DENG; BRITTAIN, W et al.Polymer bulletin (Berlin. Print). 1999, Vol 42, Num 6, pp 635-639, issn 0170-0839Article

A new zeotype borogermanate β-K₂B₂Ge₃O₁₀: Synthesis, structure, property and conformational polymorphismPAN, Chun-Yang; MAI, Hai-Deng; YANG, Guo-Yu et al.Microporous and mesoporous materials. 2013, Vol 168, pp 183-187, issn 1387-1811, 5 p.Article

The first enzymatic method for C-¹⁸F bond formation: the synthesis of 5'-[¹⁸F]-fluoro-5'-deoxyadenosine for imaging with PETMARTARELLO, Laurent; SCHAFFRATH, Christoph; HAI DENG et al.Journal of labelled compounds & radiopharmaceuticals. 2003, Vol 46, Num 13, pp 1181-1189, issn 0362-4803, 9 p.Article

Polymerization of methyl methacrylate with non-bridged zirconocene catalystsSHIONO, T; SAITO, T; SAEGUSA, N et al.Macromolecular chemistry and physics (Print). 1998, Vol 199, Num 8, pp 1573-1579, issn 1022-1352Article

Fluorine Speciation Analysis Using Reverse Phase Liquid Chromatography Coupled Off-Line to Continuum Source Molecular Absorption Spectrometry (CS-MAS): Identification and Quantification of Novel Fluorinated Organic Compounds in Environmental and Biological SamplesZHIWEI QIN; MCNEE, David; GLEISNER, Heike et al.Analytical chemistry (Washington). 2012, Vol 84, Num 14, pp 6213-6219, issn 0003-2700, 7 p.Article

Sub-50 nm feature sizes using positive tone molecular glass resists for EUV lithographySEUNG WOOK CHANG; AYOTHI, Ramakrishnan; BRATTON, Daniel et al.Journal of material chemistry. 2006, Vol 16, Num 15, pp 1470-1474, issn 0959-9428, 5 p.Article

Monte Carlo simulation on line edge roughness after development in chemically amplified resist of post-optical lithographySAEKI, Akinori; KOZAWA, Takahiro; TAGAWA, Seiichi et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 69230S.1-69230S.6, issn 0277-786X, isbn 978-0-8194-7108-6Conference Paper

Molecular glass resists for next generation lithographyBRATTON, Daniel; AYOTHI, Ramakrishnan; FELIX, Nelson et al.Proceedings of SPIE, the International Society for Optical Engineering. 2006, issn 0277-786X, isbn 0-8194-6196-2, 2Vol, Part 1, 61531D.1-61531D.9Conference Paper

Fundamentals of the reaction-diffusion process in model EUV photoresistsLAVERY, Kristopher A; CHOI, Kwang-Woo; HAI DENG et al.Proceedings of SPIE, the International Society for Optical Engineering. 2006, issn 0277-786X, isbn 0-8194-6196-2, 2Vol, Part 1, 615313.1-615313.8Conference Paper

Diverse Metabolic Profiles of a Strepromyces Strain Isolated from a Hyper-arid EnvironmentRATEB, Mostafa E; HOUSSEN, Wael E; JASPARS, Marcel et al.Journal of natural products (Print). 2011, Vol 74, Num 9, pp 1965-1971, issn 0163-3864, 7 p.Article

Materials for future lithographySEUNG WOOK CHANG; DA YANG; HAI DENG et al.SPIE proceedings series. 2005, isbn 0-8194-5733-7, 2Vol, Part 1, 1-9Conference Paper

Phenolic molecular glasses as resists for next generation lithographyANDRE, Xavier; JIN KYUN LEE; DE SILVA, Anuja et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65194B.1-65194B.10, issn 0277-786X, isbn 978-0-8194-6638-9Conference Paper